Stress Level Biases Types of Dislocation Interactions in Thin Films
Recently we discovered (Fertig and Baker (2012) Mat. Sci. Eng. A 551:67-72) that the likelihood of a threading dislocation interacting with another threading dislocation is strongly dependent on film stress. Our modeling efforts showed that films near their critical stress had the highest likelihood of interaction, as measured by a capture cross-section the thread. This is highly significant because it opens up the possiblity of tailoring dislocation structures (interaction types) using very specific stresses during film deposition--potentially controlling the number of threads remaining in the film.